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Tag high-k [18 articles]

Articoli recentemente classificati sotto il tag high-k.
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  • Etch characteristics of HfO2 films on Si substrates
    Applied Surface Science, Vol. 187, No. 1-2. (14 February 2002), pp. 75-81.
    by S Norasetthekul, PY Park, KH Baik, KP Lee, JH Shin, BS Jeong, V Shishodia, DP Norton, SJ Pearton
    posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:28:42 as **
  • Plasma etching of high dielectric constant materials on silicon in halogen chemistries
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 1. (2004), pp. 88-95.
    by Lin Sha, Jane P Chang
    posted to bcl3 cl2 hfo2 high-k zro2 by these_morel on 2006-02-21 09:44:45 as **
  • Ion-enhanced chemical etching of HfO[sub 2] for integration in metal--oxide--semiconductor field effect transistors
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 6. (2003), pp. 2420-2427.
    by Lin Sha, Ragesh Puthenkovilakam, You S Lin, Jane P Chang
    posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:36:28 as **
  • Etching of high-k dielectric Zr[sub 1 - x]Al[sub x]O[sub y] films in chlorine-containing plasmas
    The 47th international symposium: Vacuum, thin films, surfaces/interfaces, and processing NAN06, Vol. 19, No. 4. (2001), pp. 1361-1366.
    by K Pelhos, VM Donnelly, A Kornblit, ML Green, RB Van Dover, L Manchanda, Y Hu, M Morris, E Bower
    posted to bcl3 cl2 dielectric high-k zralo by these_morel on 2006-02-21 09:50:49 as **
  • Plasma etching of HfO[sub 2] at elevated temperatures in chlorine-based chemistry
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, No. 1. (2006), pp. 30-40.
    by M Helot, T Chevolleau, L Vallier, O Joubert, E Blanquet, A Pisch, P Mangiagalli, T Lill
    posted to cl2 dielectric etching hfo2 high-k by these_morel on 2006-02-21 09:56:36 as **
  • Plasma etching selectivity of ZrO[sub 2] to Si in BCl[sub 3]/Cl[sub 2] plasmas
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 21, No. 6. (2003), pp. 1915-1922.
    by Lin Sha, Jane P Chang
    posted to bcl3 cl2 etching high-k zro2 by these_morel on 2006-02-21 09:40:20 as ** along with 1 person newmansc
  • Single Metal Gate on High-k Gate Stacks for 45nm Low Power CMOS
    Electron Devices Meeting, 2006. IEDM '06. International (2006), pp. 1-4.
    by WJ Taylor, C Capasso, B Min, B Winstead, E Verret, K Loiko, D Gilmer, RI Hegde, J Schaeffer, J Schaeffer, E Luckowski, A Martinez, M Raymond, C Happ, DH Triyoso, S Kalpat, A Haggag, D Roan, JY Nguyen, LB La, L Hebert, J Smith, D Jovanovic, D Burnett, M Foisy, N Cave, PJ Tobin, SB Samavedam, Jr, S Venkatesan
    posted to hfo2 high-k metal-gate tac by these_morel on 2008-05-21 07:12:22 as **
  • Hafnium and zirconium silicates for advanced gate dielectrics
    Journal of Applied Physics, Vol. 87, No. 1. (2000), pp. 484-492.
    by GD Wilk, RM Wallace, JM Anthony
    posted to dielectric high-k by these_morel on 2006-02-21 09:01:27 as **
  • Ion-enhanced chemical etching of ZrO[sub 2] in a chlorine discharge
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 20, No. 5. (2002), pp. 1525-1531.
    by Lin Sha, Byeong O Cho, Jane P Chang
    posted to cl2 high-k zro2 by these_morel on 2006-02-21 09:47:00 as **
  • notes Plasma etching of high-k and metal gate materials
    Vacuum, Vol. In Press, Corrected Proof
    by Keisuke Nakamura, Tomohiro Kitagawa, Kazushi Osari, Kazuo Takahashi, Kouichi Ono
    posted to ecr hfo2 high-k metal by these_morel on 2006-02-17 15:39:06 as read
  • notes Integration of Dual Metal Gate CMOS on High-k Dielectrics Utilizing a Metal Wet Etch Process
    Electrochemical and Solid-State Letters, Vol. 8, No. 10. (2005), pp. G271-G274.
    by Zhibo Zhang, SC Song, Craig Huffman, Muhammad M Hussain, Joel Barnett, Naim Moumen, Husam N Alshareef, Prashant Majhi, Johnny H Sim, Sang H Bae, Byoung H Lee
    posted to dielectric gate high-k metal wet-etching by these_morel on 2006-02-17 15:40:27 as read
  • Physical and electrical properties of Ta--N, Mo--N, and W--N electrodes on HfO[sub 2] high-k gate dielectric
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, No. 1. (2006), pp. 349-357.
    by Jiang Lu, Yue Kuo, Somenath Chatterjee, Jun Y Tewg
    posted to high-k metal-gate molybdenum tan tungsten-nitride by these_morel on 2008-05-21 07:08:55 as **
  • Effects of Nitrogen Additive Gas on Sidewall Passivation in W/TiN/High-k Dielectric Gate Etching
    Microprocesses and Nanotechnology Conference, 2000 International (2000), pp. 210-211.
    by Jae-Young Kim, Yu-Kwon Kim, Kwang-Ok Kim, Chang J Choi, Jin W Kim
    posted to dielectric etching gate high-k metal tin tungsten by these_morel on 2006-02-17 13:47:00 as read
  • notes Effects of Annealing and Ar Ion Bombardment on the Removal of HfO[sub 2] Gate Dielectric
    Electrochemical and Solid-State Letters, Vol. 7, No. 3. (2004), pp. F18-F20.
    by Jinghao Chen, Won J Yoo, Daniel SH Chan, Dim L Kwong
    posted to ar hf hfo2 high-k icp plasma wet-etching by these_morel on 2006-02-17 15:00:46 as read
  • Metal gate technology for nanoscale transistors--material selection and process integration issues
    Thin Solid Films, Vol. 462-463 (September 2004), pp. 34-41.
    by Yee-Chia Yeo
    posted to dielectric gate high-k materials metal work-function by these_morel on 2006-02-07 11:15:53 as read
  • notes Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 4. (2004), pp. 1552-1558.
    by Jinghao Chen, Won J Yoo, Zerlinda YL Tan, Yingqian Wang, Daniel SH Chan
    posted to xps high-k hfsio hfon hfo2 hfalo hbr-o2 fluorine cl2-o2 by these_morel on 2006-02-17 15:12:43 as read
  • notes Effect of hydrogen peroxide on hydrofluoric acid etching of high-k materials: ESR investigations
    Journal of Non-Crystalline Solids, Vol. 351, No. 18. (15 June 2005), pp. 1559-1564.
    by V Lowalekar, S Raghavan
    posted to dielectric etching high-k materials by these_morel on 2006-02-17 15:36:47 as read
  • High-/spl kappa//metal-gate stack and its MOSFET characteristics
    Electron Device Letters, IEEE, Vol. 25, No. 6. (2004), pp. 408-410.
    by R Chau, S Datta, M Doczy, B Doyle, J Kavalieros, M Metz
    posted to high-k metal-gate by Stanley_vrc on 2006-12-01 15:13:25 as ***
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